InVisage ~ Quantum dots film

InVisage, a Silicon-based company, are regarded as having huge potential in photonic industry. Quantum film is the most fantasy product that InVisage first pushes it into commercial market to bring up a revolution in camera to unprecedented  image quality. In addition, Quantum film can also be used in solar cell to harness more sun's power.

Mesa Imaging: SwissRanger

Mesa Imaging, spun from CSEM (Swiss Center for Electronics and Microtechnology), specializes in commercializing 3D time-of-flight (TOF) depth camera. Their TOF device debuts for a long time so that those field had used SwissRanger for 3D information requirements, like robotics field.

3DV systems : ZCam - depth camera

ZCam is the RGB and depth cameras for gesture application. 3DV systems joined Microsoft Natal project for gaming technology development, and later they were acquired by Microsoft in 2009.

iDTI: in-cell optical touch panel

Integrated Digital Technologies, Inc (iDTI), Taiwan company, recently revealed its big step to touch panel - They can operate finger touch on in-cell optical touch panel. Compared with its previous generation - touch by pen, this is really a good news

ISSCC Virtual Museum: Imager

ISSCC 50th Anniversary lists the outstanding ideas over 50 years of solid-state circuit history.

HAMAMATSU: μPMT

Hamamatsu develops a new MEMS-based photomultiplier,Micro PMT (μPMT).

Canesta: time-of-flight CMOS sensor

Recently, Canesta agree to be acquired by Microsoft.

China white LED break patent barrier

China successes in developing a new powder for producing white light on blue LED.

Title:一种氮氧化合物发光材料及其制法以及由其制成的照明或显示光源

Abstract:一种氮氧化合物发光材料，其分子式为A1-xByOzNw:Eux，其中A为碱金属、碱土金属、 稀土金属中的一种或几种；B为III-V族元素中的一种或几种且至少含有Si；0≤x≤1.0； 1.0≤y≤2.0；1.0≤z≤2.0；1.0≤w≤3.0。该发光材料被紫外、近紫外或蓝光等 激发光源如LED激发时，能发射波长在470-570nm的蓝绿色，绿色，或黄色光。本发明还 涉及该氮氧化合物发光材料的制备方法。本发明的发光材料具有激发波长范围宽、高效、稳 定的特点，制备方法简单、易于批量生产、无污染。用本发明的发光材料配合紫外、近紫 外或蓝光LED以及其它发光材料如红色荧光粉可制得新型白光LED光源。

Micron Technology: FLCOS

FLCOS(Ferroelectric Liquid Crystal On Silicon), derivative of LCoS, is used in projector.

(LCos: http://en.wikipedia.org/wiki/Liquid_crystal_on_silicon)

EUV lithography-2

Throughput is a big issue of EUV.
Why?

1.Reflective optics has finite reflectivity about 70% at 16.5nm(EUV wavelength).
2.There are more than 11 reflection surfaces from light source to waver.

So very small light power pump into waver.
One solution is to enhance the reflection of multi-layer coating, and another is to increase the power of light source.

Aptina: DR-Pix

Aptina DR-Pix: 2 mode in pixel

Low conversion gain(LCG): in bright light

High conversion gain(HCG): in low light

Aptina releases this high dynamic range technique for camera application.

Original inter-scene DR is limited to 69dB, but can be equal to 82.9dB at HCG mode.

Violet Diode Laser: Sony

Sony announce to play in violet laser diode market some time ago.

As a winner in Blue Ray Disc, Sony must take care of the most important part of optical head - laser diode.

Tessera: image optics division

major division:

1.Microelectronics

2. Imaging & Optics

EUV lithography

Lithography

1. EUV 13.5nm:眾所矚目,但問題頗多

2.193nm 硬撐

     immersion--降低wavelength

     double pattern, inverse lithography--玩材料特性

3.e-beam:速度慢

4.nanoimprint

5.self assembly:還很遙遠